IEC 63616-2025 PDF
Name in English:
St IEC 63616-2025
Name in Russian:
Ст IEC 63616-2025
Original standard IEC 63616-2025 in PDF full version. Additional info + preview on request
Full title and description
St IEC 63616-2025 — Measurement of the conductivity for metal thin films at microwave and millimeter-wave frequencies: Balanced-type circular disk resonator method. Defines a broadband, non-destructive test method using higher-order modes of a balanced circular-disk resonator to evaluate the conductivity of metal foils and thin metal layers on dielectric substrates at microwave to millimeter-wave frequencies.
Abstract
This international standard specifies a procedure for measuring electrical conductivity of metal thin films and interfacial metal layers at microwave and millimeter-wave frequencies using a balanced‑type circular disk resonator (BCDR). The method exploits higher‑order resonant modes of a single resonator to enable broadband conductivity characterization without multiple resonators, and includes guidance on sample types, resonator excitation, calibration, measurement uncertainties and data reporting.
General information
- Status: Published / Active.
- Publication date: 28 November 2025.
- Publisher: International Electrotechnical Commission (IEC).
- ICS / categories: 17.220.20; 29.050 (RF/microwave passive components; measurement techniques).
- Edition / version: Edition 1.0, 2025.
- Number of pages: 26 pages.
Scope
Specifies a laboratory method for determining the conductivity of metal thin films and interfacial metal layers at microwave and millimeter-wave frequencies using a balanced‑type circular disk resonator. Applicable sample forms include metal foils adhered to substrates and metal layers deposited on dielectric substrates. The standard covers resonator configuration, excitation of higher‑order modes, measurement procedure, calibration, data analysis and uncertainty estimation to support traceable, repeatable conductivity results.
Key topics and requirements
- Balanced‑type circular disk resonator (BCDR) technique using higher‑order modes for broadband measurements.
- Test method suitable for metal foils and thin metal layers on dielectric substrates (including interfacial conductivity assessment).
- Detailed measurement setup: resonator mounting, excitation, vector network analyzer configuration and calibration.
- Procedure for extracting conductivity from resonant frequency and quality‑factor data across microwave to millimeter‑wave bands.
- Requirements for reporting, uncertainty evaluation and repeatability to support metrology and quality‑control needs.
Typical use and users
Intended for metrology institutes, university and industrial research laboratories, RF/microwave materials researchers, test laboratories, and manufacturers of metal foils, plated substrates and RF components who need traceable, non‑destructive conductivity data at microwave and millimeter‑wave frequencies for design, quality control and materials development.
Related standards
Published under the responsibility of IEC technical committee TC 46/SC 46F (RF and microwave passive components). National and regional adoptions or harmonized versions (for example BS EN IEC 63616:2026) have been registered following the IEC publication. Related measurement and RF component standards addressing material characterization, resonator techniques and VNA calibration practices are commonly referenced alongside this standard.
Keywords
conductivity measurement; metal thin films; microwave; millimeter‑wave; balanced circular disk resonator; BCDR; higher‑order modes; resonator method; vector network analyzer; interfacial conductivity; non‑destructive testing.
FAQ
Q: What is this standard?
A: An IEC international standard (IEC 63616:2025) that specifies a balanced‑type circular disk resonator method for measuring the electrical conductivity of metal thin films at microwave and millimeter‑wave frequencies.
Q: What does it cover?
A: The standard covers the resonator method principle, test setup, excitation of higher‑order modes, measurement procedure, calibration and uncertainty assessment for conductivity extraction from resonance data, and applies to metal foils adhered to substrates and metal layers on dielectric substrates.
Q: Who typically uses it?
A: Metrology institutes, RF/microwave materials researchers, test laboratories, and manufacturers of metal foils, plated substrates, PCBs and RF components that require traceable, broadband conductivity data for design verification, process control and research.
Q: Is it current or superseded?
A: It is current — published 28 November 2025 and listed as an active IEC International Standard (edition 1.0). The IEC webstore records a stability date indicating expected stability through 2028. Users should check national adoption documents for any later amendments or regional versions.
Q: Is it part of a series?
A: It is a standalone IEC international standard developed under TC 46/SC 46F and may be used alongside other IEC and EN standards dealing with RF/microwave measurement methods, resonator techniques and VNA calibration; regional adoptions (for example BS EN IEC 63616) may follow the IEC publication.
Q: What are the key keywords?
A: Conductivity measurement, metal thin films, microwave, millimeter‑wave, balanced circular disk resonator, BCDR, interfacial conductivity, broadband measurement, VNA calibration.