DIN SPEC 1994 E 2016-07 PDF

Full title and description

STB DIN SPEC 1994 E 2016-07 — Testing of materials for semiconductor technology: Determination of anions in weak acids. This designation refers to the E DIN SPEC edition originally published in mid‑2016 that specifies a laboratory procedure for trace determination of common anions in weak acidic matrices used in semiconductor processing.

Abstract

This document defines a method to determine chloride, sulfate, nitrate and phosphate at trace levels (nominally 10 ng/g to 1 000 ng/g) in matrices such as hydrofluoric acid, ammonium fluoride solutions and acetic acid, with scope for verified extension to other weak acids (for example formic or glycolic acid) after prior testing. The procedure uses preconcentration (enrichment) and chromatographic separation appropriate for semiconductor‑grade analytical control.

General information

• Status: Withdrawn / superseded (the E DIN SPEC 1994:2016-07 edition has been replaced by DIN SPEC 1994:2017-02).
• Publication date: E DIN SPEC 1994:2016-07 — July 2016 (published mid‑2016); superseding edition DIN SPEC 1994:2017-02 — 1 February 2017.
• Publisher: Deutsches Institut für Normung (DIN).
• ICS / categories: 29.045 — Semiconducting materials / Materials testing for semiconductor technology.
• Edition / version: E DIN SPEC 1994:2016-07 (original E‑edition, withdrawn) — replaced by DIN SPEC 1994:2017-02.
• Number of pages: 11 pages (typical published length for the DIN SPEC 1994 document).

Scope

The (E) DIN SPEC covers a validated analytical procedure for the determination of the anions chloride (Cl‑), sulfate (SO4 2‑), nitrate (NO3 ­) and phosphate (PO4 3‑) in weak acid process chemistries used in semiconductor manufacturing — specifically hydrofluoric acid, ammonium fluoride solutions and acetic acid — across the range of ~10 ng/g to 1 000 ng/g. The method is bounded by the capacity of the enrichment (preconcentration) columns and the analytical separation column; sample dilution or modification may be necessary to bring samples into the working range. After appropriate verification, the procedure may be applied to other weak acids (e.g., formic or glycolic acid).

Key topics and requirements

• Target analytes: chloride, sulfate, nitrate and phosphate at trace (ng/g) concentrations.
• Matrices addressed: hydrofluoric acid (HF), ammonium fluoride solutions, acetic acid; possible extension to other weak acids after verification.
• Analytical approach: preconcentration/enrichment step followed by chromatographic separation (column capacity and separation performance limit the working range).
• Working concentration range: approximately 10 ng/g to 1 000 ng/g (method performance established within this range).
• Quality requirements: contamination control, use of appropriate blanks and calibrations, and verification of method suitability for each matrix and concentration range.
• Limitations: method applicability constrained by column capacity and matrix effects; sample dilution or matrix adjustments may be required.

Typical use and users

Used by semiconductor fabs, process chemistry suppliers, analytical contract laboratories and quality/control departments responsible for incoming materials and process bath monitoring. Typical applications include trace‑ion purity checks of wet‑process chemicals, incoming inspection of process fluids and root‑cause analysis of contamination events.

Related standards

Relevant companions and neighbouring standards include the later DIN SPEC 1994:2017-02 (replacement edition) and other DIN and international standards on semiconductor materials testing and trace‑ion analysis; users commonly consult related DIN 504xx series documents and ISO/DIN guidance on analytical quality assurance when implementing laboratory control procedures.

Keywords

semiconductor materials; anions; chloride; sulfate; nitrate; phosphate; hydrofluoric acid; ammonium fluoride; acetic acid; trace analysis; preconcentration; ion chromatography; DIN SPEC 1994; 2016; 2017.

FAQ

Q: What is this standard?

A: A DIN SPEC technical report that defines a laboratory procedure for determining trace anions (Cl‑, SO4 2‑, NO3 ­, PO4 3‑) in weak acidic process chemicals used in semiconductor manufacturing.

Q: What does it cover?

A: The method covers sample preconcentration/enrichment, chromatographic separation and quantification of the listed anions in matrices such as hydrofluoric acid, ammonium fluoride solutions and acetic acid, in the concentration range of about 10 ng/g to 1 000 ng/g. It also notes capacity‑related limits and possible extension to other weak acids after verification.

Q: Who typically uses it?

A: Semiconductor fabs, process chemical manufacturers, analytical labs and QC/process engineers who need trace‑level assurance of wet‑process chemicals.

Q: Is it current or superseded?

A: The E DIN SPEC 1994:2016-07 edition has been superseded by DIN SPEC 1994:2017-02 (published 1 February 2017). Consult the 2017 edition for the current technical report.

Q: Is it part of a series?

A: Yes — it is part of DIN's body of materials‑testing guidance for semiconductor technology (DIN SPEC numbering within the semiconductor/materials testing topic). Users often reference related DIN documents on semiconductor material testing and analytical methods.

Q: What are the key keywords?

A: Semiconductor materials, anions, hydrofluoric acid, ammonium fluoride, acetic acid, trace analysis, preconcentration, ion chromatography, DIN SPEC 1994.